Continuous substrate rotation, tilt, heating and electrical biasing
The EC-R supports the substrate at a right-angle to the plane of the mounting flange. It can then provide continuous substrate rotation, tilt, heating and electrical biasing. The EC-R can be mounted on UHVD's range of manipulators to provide motion in the X, Y and Z axes. The base EC-R configuration provides polar rotation to adjust the angle of incidence (with respect to the deposition flux and sample heating). The modular EC-R concept provides the flexibility to select options such as azimuthal rotation (to continuously rotate the substrate to maximise temperature) and deposition uniformity.
- 2" to 6" substrate diameters
- Substrate heating to 1200°C
- Continuous azimuthal rotation
- Polar rotation (tilt) up to +/- 180°
- DC/RF substrate biasing
Tailored for specific applications
Electrical biasing is also available (DC and/or RF). This can facilitate sputter cleaning prior to deposition or for better control of deposition kinetics. ‘Faraday Dark Space Shielding’ is supplied as standard on all biased stages. This confines plasma to the substrate cradle region. Our proprietary substrate biasing technology provides unrivalled flicker-free performance, typically with zero maintenance and long operational life. X, Y and Z motion can then be added to tailor the stage to meet your specific application.
Unrivalled performance and durability
This stage was born from a complete review of existing right-angled deposition stages. Rethinking the concept completely, the EC-R provides unrivalled performance and durability. By stacking two magnetically-coupled MagiDrive rotary feedthroughs, UHV Design is able to achieve a dual-axis, concentric rotation system. This eliminates the head positioning gear train typically used in other designs.
Secure Sample Transfer
The absence of any bellows, O-rings or dynamic seals ensures clean, true UHV performance with high reliability. Magnetically coupled sample transfer arms with secure bayonet-style sample holders provide reliable and secure sample transfer. This makes EC-r the ideal choice for critical applications.
By incorporating our latest heater module technology into this stage, we’ve achieved radical improvements to conventional designs. This is in terms of the ultimate temperature capability and uniformity. Consequently, this positively affects deposition uniformity. There’s significant technology within the rotary head to enable continuous azimuthal rotation with high precision positioning - all whilst heating from ambient to 1200oC. As standard, refractory metal deposition shielding is provided to protect the heating module. The EC-R can also be configured specifically as a retrofit instrument for MBE systems, e.g. VG Semicon V80H.
1. Azimuthal rotation
Continuous azimuthal rotation to maximise temperature and deposition uniformity. Smooth, long-life rotation, typically up to 20rpm tolerant of high temperatures.
2. Polar rotation
Provides the ability to tilt the sample with respect to a deposition flux.
3. Thermocouple options
Type C and Type K options available with choice of UHV and HV fittings and height adjustment. HV versions include an o-ring sealed connector allowing thermocouple position to be adjusted to match the pyrometer reading of the substrate temperature, eliminating the need for calibration adjustments.
4. DC & RF bias
Our proprietary substrate biasing technology provides unrivalled flicker-free performance, typically with zero maintenance and long operational life.
5. Z motion
Use of UHVD's linear shift mechanism to provide Z motion with strokes from 50 - 300mm and motorisation options.
6. XY motion
Precise X & Y motion up to +/- 19mm (+/-27mm vector) with motorisation options.
7. Solid Silicon Carbide heater element
Solid SiC heaters are manufactured from a conducting solid SiC material in the ß phase and are more robust in all respects. They are durable under mechanical or electrical shocking and when exposed to reactive gases including oxidising atmospheres at high temperature. They are also optimised to give the very best in temperature uniformity.
|Substrate diameter||50mm (2")||100mm (4")||150mm (6")|
|CF150/8" OD system flange||Available||Not available||Not available|
|CF200/10" OD system flange||Available||Available||Not available|
|CF250/12" OD system flange||Available||Available||Available|
|Adjustable position||Manual (1° resolution)|
|Heater element||Silicon Carbide coated graphite (SiCg) as standard (see options below)|
|Achievable temperature||1200°C (based on heating a Molybdenum sample)|
|STAGE MOTION OPTIONS|
|Stepper motorised||0.025° resolution|
|Manually driven||Manual thimble|
|DC motorised||Up to 60rpm (maximum 20rpm recommended with bias)|
|Stepper motorised||Up to 60rpm (maximum 20rpm recommended with bias)|
|XYZ Motion Options||XL-T Range||XL-R Range|
|Z stroke range offered||50-300mm||50-1000mm|
|Resolution stepper motorised||0.001mm||0.001mm|
|Manual actuation||+/- 15mm (+/-21mm vector)||+/- 19mm (+/-27mm vector)|
|X-Y resolution manual||0.001mm||0.01mm|
|Motorised actuation||+/- 14mm (+/-20mm vector)||+/- 18mm (+/-25.5mm vector)|
|X-Y Resolution stepper motorised||0.0025mm||0.005mm|
|Adjustable position (manual)||+/-2°||N/A|
|DC & RF bias||DC bias ≤ 1kV, RF ≤ 40W (including dark space shielding)|
|Heater element||Solid Silicon Carbide (sSiC)|
|Insertion length (nominally 240mm)||Customer specified|
|Motorisation||Stepper or Smart Motor (DC only for azimuthal)|
|X,Y and Z encoders||Option|
|Azimuthal home position sensor||Option|
|Temperature measurement||Type K or Type C thermocouple|
|Water cooling of head assembly (NOT substrate) to aid heat dissipation||Option|
If you would like to discuss your project with our engineering team, please contact us.